Post Offer Free
Zhengzhou Tainuo Film Materials Co., Ltd.  

Gold Index: 1302

You are here: home  > magnetron sputtering coating  > vacuum PVD coating machine

vacuum PVD coating machine 

Price: 10000.0 USD 
Payment Terms: T/T,WU,Paypal,Money Gram 
Place of Origin: Henan, China (Mainland) 
inquire
Add to My Favorites
HiSupplier Escrow
Share |

Product Detail

Model No.: CY-MSP180G-DC
Production Capacity: 100 sets/month
Delivery Date: 30 days
Overall size: 550mm x 350mm x 400mm
Chamber size: φ180mm x 215mm
Magnetron sputtering head: 2" x1
Heating: Max. 500℃
Pumping rate: Mechanical pump 1.1L/s Mole...
Means of Transport: Air
Packing: tandard export fumigation s...
Application: thin film R&D
Total power: 2kW
Sample stage size: φ100mm
Rotating speed: 0-20rpm adjustable
Ultimate vacuum: 1.0E-4Pa

DC magnetron sputtering can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on

CY-MSP180G-DC Desktop single sputter head magnetron sputtering coater 


Intro

Small desktop single-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization.

  •  The magnetron target head has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated.

  • The device is equipped with 150W DC power supply, which can be used for metal sputter coating. 

  • The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gas, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs. 

  • The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.

 

Application:

The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.


Technical parameter

Sample stage

Size φ100mm

Heating Max. 500℃

Rotating speed 0-20rpm adjustable

Magnetron sputtering head

Quantity 2" x1

Vacuum chamber

Chamber size φ180mm x 215mm

Observation window Omnidirectional transparent

Chamber material High purity quartz

Open method Upper cover removable

Vacuum system

Mechanical pump Rotary vane pump

Pumping port KF16

Exhaust interface KF16

Molecular pump Turbomolecular pump

Pumping port KF40

Exhaust interface KF40

Vacuum measurement Resistance gauge + ionization gauge

Ultimate vacuum 1.0E-4Pa

Power supply AC 220V 50/60Hz

Pumping rate Mechanical pump 1.1L/s Molecular pump 600L/s

Power configuration

Quantity DC power supply x1

Max. output power DC power supply 150W

Others

Supply voltage AC220V, 50Hz

Total power 2kW

Overall size 550mm x 350mm x 400mm

Detail pictures


bigPhoto
 Mr. JiBin wang

Tel: 86-371-65321580
Mobile: 139 4900 8646
Contact to this supplier

Didn't find what you're looking for? Post Buying Lead or contact HiSupplier Customer Service Center  for help!

Related Search

Find more related products in following catalogs on Hisupplier.com

Company Info

Zhengzhou Tainuo Film Materials Co., Ltd. [China (Mainland)]


Business Type:Manufacturer, Trading Company
City: Zhengzhou
Province/State: Henan
Country/Region: China (Mainland)

You May Like: