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Zhengzhou Tainuo Film Materials Co., Ltd.  

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magnetron sputtering coating machine 

Price: 11000.0 USD 
Payment Terms: T/T,WU,Paypal,Money Gram 
Place of Origin: Henan, China (Mainland) 
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Product Detail

Model No.: CY-MSP180G-RS
Production Capacity: 100 sets/month
Delivery Date: 30 days
Chamber size: φ180mm x 215mm
Observation window: Omnidirectional transparenc...
Target diameter: 2 inches
Reciprocating speed: 0~50mm/s
Pumping rate: Mechanical pump 1.1L/s Mole...
Means of Transport: Air
Packing: tandard export fumigation s...
Application: thin film R&D
Chamber material: High purity quartz
Target thickness: Recommended 2~5mm
Reciprocating sample table: 50*100 mm
Ultimate vacuum: 1.0E-4Pa

our desktop single target magnetron sputtering coating machine witch is suitable for aluminum plating and other materials that are sensitive to air.

Desktop single target magnetron sputtering coater with reciprocating sample table

 

Intro

  • high cost performance magnetron sputtering coating equipment independently developed by our company, which has the characteristics of miniaturization and standardization.

  • The magnetron target can be selected from 1 inch and 2 inches, and customers can choose according to the size of the substrate to be plated;

  •  the power supply is 150W DC power supply, which can be used for metal sputtering coating. 

  • The coating instrument is equipped with a vent interface, which can be filled with protective gas. If the customer needs to mix gas, you can contact the staff to configure a high-precision mass flow meter to meet the needs of the experiment. 

  • The instrument is equipped with advanced turbo molecular pump set, the ultimate vacuum can reach 1.0E-5Pa, and other types of molecular pumps are also available for purchase.

 

Application scope:

DC magnetron sputtering can be used to prepare single-layer ferroelectric films, conductive films, alloy films, etc. Compared with similar equipment, this single-target magnetron sputtering coating instrument is compact in design, highly integrated, compact, and can be placed on a table for use. It is an ideal equipment for preparing material films in the laboratory.

 

Technical parameters:

Reciprocating sample table

size 50*100mm

Reciprocating speed 0~50mm/s

Magnetron target gun

Target plane Circular flat target

Sputtering vacuum 10Pa~0.2Pa

Target diameter 2 inches

Target thickness Recommended 2 ~ 5mm

Target temperature ≦65℃

Vacuum chamber

Cavity size About Φ180mm × H 215mm

Cavity material High purity quartz

Observation window Omnidirectional transparency

Opening method Removable top cover

Power supply

DC power supply 150W max

Molecular pump system

Foreline pump

Rotary vane pump VRD-4 

Pumping speed 1.1L/S

Ultimate vacuum 5*10-1Pa

Molecular pump Molecular pumping speed 600L/S

Rated speed 24000rpm

Ultimate vacuum 5*10-5Pa

Vibration value ≦0.1um

Start Time ≦4.5min

Downtime <7min

cooling method Water cooling + air cooling

Water cooler

Cooling water temperature ≦37℃

Cooling water flow rate 10L/min

Supply voltage

AC220V 50Hz

Detail picture


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 Mr. JiBin wang

Tel: 86-371-65321580
Mobile: 139 4900 8646
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Company Info

Zhengzhou Tainuo Film Materials Co., Ltd. [China (Mainland)]


Business Type:Manufacturer, Trading Company
City: Zhengzhou
Province/State: Henan
Country/Region: China (Mainland)

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